Community Household Hazardous Waste Collection

01/24/2005

BREWER SCIENCE, INC., AND THE CITY OF ROLLA SANITATION DEPARTMENT WILL HOST A RESIDENTIAL HOUSEHOLD HAZARDOUS WASTE COLLECTION ON APRIL 23, 2005, IN ROLLA.

The 4th Annual Residential Household Hazardous Waste Collection is scheduled for Saturday, April 23, 2005. This event will be held fr...

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Category: Company Press Releases

Brewer Science and Nantero, Inc. Enter Into Agreement

01/21/2005

January 21, 2005 - Brewer Science, Inc. is pleased to announce that it has entered into an agreement with Nantero, Inc. of Woburn, Massachusetts to commercialize CMOS-grade carbon nanotube solution utilizing processes developed by Nantero. This will allow carbon nanotubes (CNT) to be used in semicon...

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Category: Company Press Releases

Brewer Science at a Glance

01/03/2005

BREWER SCIENCE AT A GLANCE

OVERVIEW: Brewer Science Inc. is a privately held company founded in 1981 in Rolla MO. Thanks to a heavy emphasis on research, it has become a leader in innovative chemical and instrument solutions for the microelectronic, optoelectronic, MEMS and sensor industries. ...

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Category: Company Press Releases

Brewer Science Co-Presents Meramec Regional Art Exhibit and Reception at St. Louis World Trade Center

10/19/2004

Brewer Science, Inc. of Rolla, MO, is proud to announce that it is co-presenting the fourth annual "Pure Enjoyment" art exhibit at the World Trade Center in Clayton, Missouri in cooperation with the World Trade Center and Art Saint Louis.  The exhibit of juried artwork will be on display from N...

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Category: Company Press Releases

Brewer Science® and Dow Chemical Company
Align to Unveil New Anti-Reflective Coatings for Semiconductor Industry.

10/04/2004

Brewer Science, the leader in bottom anti-reflective coatings since 1981, today announced a multi-year exclusive agreement with The Dow Chemical Company (NYSE:DOW) for the joint development of ENSEMBLE* ARC® advanced bottom anti-reflective coatings (BARCs) for the semiconductor industry.  Under...

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Category: Company Press Releases, ARC® Press Releases

ARC28 and ARC29A 193nm Anti-Reflective Coatings

10/03/2004

Introducing three new ArF anti-reflective coatings – ARC®27, ARC®28, and ARC®29A. These products offer improved optical parameters, etch characteristics and an increased depth of focus required by the current design rules. All three materials are designed for use in the ArF (193nm) photolithography ...

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Category: Company Press Releases, ARC® Press Releases

The Anti-Reflective Coatings '04 Symposium - Albany

08/03/2004

Brewer Science is pleased to announce the Anti-Reflective Coatings '04 Symposium - Albany, New York, to be held October 28th, 2004. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discuss technical challenges and collaborative solutions relate...

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Category: Company Press Releases, ARC® Press Releases, R&D Press Releases