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Focus On Technology04/19/2007April 19, 2007 - Brewer Science, Inc., headquartered in Rolla’s Hy-Point Industrial Park, announced an organizational change that will enhance its well-established ability to bring new, creative technologies to market that promote the growth and success of its customers. Category: Company Press Releases Brewer Science Releases ARC®160 Series02/26/2007Brewer Science, a leading supplier of advanced lithography materials, has released ARC®160, a ArF (193nm) anti-reflective coating that is demonstrating, as POR at large semiconductor fabricators, faster etch and dramatically lower out-gassing in the newer bake module than other ARC®<... Category: Company Press Releases, ARC® Press Releases Brewer Science Releases ARC®100 Coatings Series01/26/2007The ARC®100 coatings series is a new set of ArF bottom anti-reflective coatings (BARCs) from Brewer Science which can be modified to meet specific k-value needs. Tunable-k ARC®100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical... Category: Company Press Releases, ARC® Press Releases EV Group & Brewer Science cooperate in ultrathin wafer handling solution development08/07/2006Contact information: Category: Company Press Releases 2006 American Forest & Paper Association Business Leadership Recycling Award04/12/2006WASHINGTON, DC, April 12, 2006 - The American Forest & Paper Association (AF&PA) today announced that Brewer Science, Inc. of Rolla, Missouri has received the 2006 AF&PA Business Leadership Recycling Award in the large business category. The award recog... Category: Company Press Releases ProTEK™ Temporary Etch Protective Coatings02/20/2006Brewer Science is pleased to announce the development of a new temporary protective coating system for basic etchants which offer customers an alternative to their current wet-etch process materials. ProTEK™ etch protective coatings are spin-applied polymeric coatings designed to give maximum protec... Category: Company Press Releases, SMD Press Releases 65nm node processings ArF Anti-Reflective Coating ARC®29A02/18/2006Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings. Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight
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